Control of pore size in mesoporous silica by incremental surface modification using tetramethyl orthosilicate

Chemistry Letters

Volumn 34, Issue 4, 2005, Pages 596-597

  Ishimaru, Ryohei ^a   Shibasaki, Yusuke ^a   Hara, Michikazu ^a   Ueda, Mitsuru ^a   Domen, Kazunari ^b   Kondo, Junko N ^a,c  

^a Tokyo Institute of Technology ^*  (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c NEW ENERGY AND INDUSTRIAL TECHNOLOGY DEVELOPMENT ORGANIZATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SILANE DERIVATIVE; SILICON DIOXIDE; TETRAMETHOXYSILANE; WATER;

ARTICLE; CHEMICAL MODIFICATION; CHEMICAL PROCEDURES; CHEMICAL REACTION; CHEMICAL STRUCTURE; SURFACE PROPERTY; WATER TREATMENT;

EID: 21644436208     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2005.596     Document Type: Article

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