Control of pore size in mesoporous silica by incremental surface modification using tetramethyl orthosilicate

Chemistry Letters

Volumn 34, Issue 4, 2005, Pages 596-597

  Ishimaru, Ryohei ^a   Shibasaki, Yusuke ^a   Hara, Michikazu ^a   Ueda, Mitsuru ^a   Domen, Kazunari ^b   Kondo, Junko N ^a,c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c NEW ENERGY AND INDUSTRIAL TECHNOLOGY DEVELOPMENT ORGANIZATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SILANE DERIVATIVE; SILICON DIOXIDE; TETRAMETHOXYSILANE; WATER;

ARTICLE; CHEMICAL MODIFICATION; CHEMICAL PROCEDURES; CHEMICAL REACTION; CHEMICAL STRUCTURE; SURFACE PROPERTY; WATER TREATMENT;

EID: 21644436208     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2005.596     Document Type: Article

References (7)

1. J. S. Beck, J. C. Vartuli, W. J. Roth, M. E. Leonowicz, C. T. Kresge, K. D. Schimitt, T.-W. C. Chu, D. H. Olson, E. W. Sheppard, S. B. McCullen, J. B. Higgins, and J. L. Schlenker, J. Am. Chem. Soc., 114, 10834 (1992).
2. D. Zhao, J. Feng, Q. Huo, N. Melosh, G. H. Fredrickson, B. F. Chmelka, and G. D. Stucky, Science, 279, 548 (1998).
3. S. K. Jana, A. Mochizuki, and S. Namba, Catal. Surv. Asia, 8, 1 (2004).
4. M. Niwa, M. Kato, T. Hattori, and Y. Murakami, J. Chem. Soc., Faraday Trans., 80, 3135 (1984).
5. S. C. Laha, P. Mukherjee, and R. Kumar, Bull. Mater. Sci., 22, 623 (1999).
6. M. Ogawa, K. Kuroda, and T. Nakamura, Chem. Lett., 2002, 632.
7. B. Lee, D. Lu, J. N. Kondo, and K. Domen, Chem. Lett., 2002, 1058.