Reactively sputtered RuO2 diffusion barriers

Applied Physics Letters

Volumn 50, Issue 13, 1987, Pages 854-855

  Kolawa, E ^a   So, F C T ^a   Pan, E T S ^a   Nicolet, M A ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21544479801     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.98012     Document Type: Article

References (7)