Properties of carbon nitride films with composition ratio C/N=0.5-3.0 prepared by the ion and vapor deposition method

Journal of Applied Physics

Volumn 76, Issue 6, 1994, Pages 3791-3796

  Ogata, Kiyoshi ^a   Chubaci, José Fernando Diniz ^b   Fujimoto, Fuminori ^c  

^a NISSIN ELECTRIC CO LTD   (Japan)

^b UNIVERSITY OF SÃO PAULO   (Brazil)

^c OKAYAMA UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21544470322     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.358497     Document Type: Article

References (14)