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Journal of Applied Physics

Volumn 65, Issue 6, 1989, Pages 2342-2356

Trap creation in silicon dioxide produced by hot electrons

(2) DiMaria, D J a Stasiak, J W a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21544467967 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.342824 Document Type: Article

Times cited : (535)

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