Structural characterization of aluminum films deposited on sputtered-titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane

Applied Physics Letters

Volumn 67, Issue , 1995, Pages 3426-

  Li, Xiaodong ^a   Kim, Byoung Youp ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

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Indexed keywords

EID: 21544456525     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115268     Document Type: Article

References (10)