Measurements of the three-dimensional impurity profile in Si using chemical etching and scanning tunneling microscopy

Applied Physics Letters

Volumn 58, Issue 20, 1991, Pages 2288-2290

  Takigami, Takako ^a   Tanimoto, Masafumi ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21544450078     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.104901     Document Type: Article

References (11)