Plasma Si nitride - A promising dielectric to achieve high-quality silicon MIS/IL solar cells

Journal of Applied Physics

Volumn 52, Issue 4, 1981, Pages 3076-3079

  Hezel, R ^a   Schorner R ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

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EID: 21544447469     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.329058     Document Type: Article

References (20)