High critical current density ultrathin YBa2Cu3O x films made by a modified rf-magnetron sputtering technique

Journal of Applied Physics

Volumn 67, Issue 5, 1990, Pages 2512-2515

  Gao, J ^a   Hauser B ^a   Rogalla, H ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

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Indexed keywords

EID: 21544441859     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.345503     Document Type: Article

References (7)