SCOPUS 정보 검색 플랫폼

Volumn 61, Issue 11, 1987, Pages 5084-5088

Silicided shallow junction formation by ion implantation of impurity ions into silicide layers and subsequent drive-in

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21544433060 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.338333 Document Type: Article

Times cited : (55)

References (13)

3
- 0000112472
- edited by N. G. Einspruch and G. B. Larrabee (Academic, New York), Vol. 6, Chap. 6
- (1983) VLSI Electronics: Micrastructure Science , pp. 329
- Nicolet, M.A.¹ Lau, S.S.²

4
- 0020252001
- edited by C. J. Dell’Oca and W. M. Bullis (Electrochemical Society, New York)
- (1982) VLSI Science and Technology/1982 , pp. 213-223
- Osburn, C.M.¹ Tsai, M.Y.² Roberts, S.³ Lucchese, C.J.⁴ Ting, C.Y.⁵

6
- 1842732310
- edited by C. J. Dell’Oca and W. M. Bullis (Electrochemical Society, New York)
- (1982) VLSI Science and Technology/1982 , pp. 224-231
- Ting, C.Y.¹ Iyer, S.S.² Osburn, C.M.³ Hu, G.J.⁴ Schweighart, A.M.⁵

10
- 84950531486
- edited by R. F. Benenson, E. N. Kanfmann, G. L. Miller, and W. W. Scholz (North Holland, Amsterdam)
- (1981) Proceedings of the 2nd International Conference on Ion Beam Modifications and Materials , pp. 81
- Mayer, J.W.¹ Tsaur, B.Y.² Lau, S.S.³ Hung, L.S.⁴

13
- 84950599092
- Proceedings of Material Research Society 1986 Spring Meeting (North Holland, Amsterdam, in press).
- Materials Issues in Si Processing
- Kwong, D.L.¹ Ku, Y.K.² Lee, S.K.³ Louis, E.⁴ Alvi, N.S.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.