Developments in Si and SiO2 Etching for MEMS based optical applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5347, Issue , 2004, Pages 44-53

  Donohue, L A ^a   Hopkins, J ^a   Barnett, R ^a   Newton, A ^a   Barker, A ^a  

^a Surface Technology Systems Plc   (United Kingdom)

Author keywords

DRIE; Gas switching; High aspect ratio; MEMS; Si etch; SiO2 etch; Smooth sidewall

Indexed keywords

ASPECT RATIO; INDUCTIVELY COUPLED PLASMA; LIGHT INTERFERENCE; LIGHT REFLECTION; LIGHT TRANSMISSION; MICROELECTROMECHANICAL DEVICES; OPTICAL DEVICES; PLASMA ETCHING;

DRIE; GAS SWITCHING; MEMS; SI ETCH; SIO2 ETCH; SMOOTH SIDEWALLS;

SILICA;

EID: 2142784216     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.524471     Document Type: Conference Paper

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