Opportunities and Challenges for Atomic, Molecular, and Optical Physics in Plasma Chemistry

Advances in Atomic, Molecular and Optical Physics

Volumn 43, Issue C, 2000, Pages 399-406

  Becker, Kurt ^a   Deutsch, Hans ^b   Inokuti, Mitio ^c  

^a Stevens Institute of Technology   (United States)

^b UNIVERSITY OF GREIFSWALD   (Germany)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2142729756     PISSN: 1049250X     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S1049-250X(08)60131-7     Document Type: Chapter

References (8)

1. Amorer, L. E., (1999) Ph.D. thesis, Stevens Institute of Technology. Unpublished
2. Amorer, L. E., Kunhardt, E. E. (1999) Private communication and to be published
3. Becker K., Bonham R.A., and Lin C.C. Z. Phys. D 24 (1992) 95
4. Garscadden A. Z. Phys. D 24 (1992) 97
5. Meyer F.W., Yan Q., van Emmichoven P.Z., Hughes I.G., and Spierings G. Nucl. Instrum. Methods Phys. Res. B 125 (1997) 138
6. NRC. Plasma processing of materials: scientific opportunities and technological challenges. (1991), National Academy Press, Washington
7. NRC. Modeling, simulation, and database needs in plasma processing (1996), National Academy Press, Washington, DC
8. Yan Q., Burgdörfer J., and Meyer F.W. Phys. Rev. B 56 (1997) 1589 1997