Thickness scaling of Pb(Zr, Ti)O3 thin films and Pt electrodes for high density FeRAM devices

Integrated Ferroelectrics

Volumn 48, Issue , 2002, Pages 139-147

  Kim, Seung Hyun ^a   Koo, C Y ^a   Ha, S M ^a   Woo, H J ^a   Park, D Y ^a   Lim, J E ^b   Hwang, C S ^b   Ha, J ^a  

^a INOSTEK Inc   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

Chemical solution deposition; Feram; Ferroelectric performance; Pzt; Scalability

Indexed keywords

EID: 2142667884     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584580215466     Document Type: Article

References (0)