The formation mechanism of the structure and internal stresses in multilayer Co/Cu films

Russian Journal of Electrochemistry

Volumn 32, Issue 6, 1996, Pages 710-713

  Tochitskii, T A ^a   Fedosyuk, V M ^a   Kasyutich, O I ^a  

^a INSTITUTE OF SOLID STATE AND SEMICONDUCTOR PHYSICS   (Belarus)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21344462104     PISSN: 10231935     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. Fedosyuk, V.M., submitted for publication in Zarubezh. Elektronika.
2. Fedosyuk, V.M. and Kasyutich, O.I., Elektrokhimiya, 1993, vol. 29, p. 913.
3. Awano, H., Suzuki, Y., Yamazaki, T., Katayama, T., and Itoh, A., IEEE Trans. Magn., 1990, vol. 26, p. 2742.
4. Tochitskii, T.A., Fedosyuk, V.M., and Kasyutich, O.I., Fiz. Tverd. Tela, 1992, vol. 34, p. 1348.
5. Kasyutich, O.I., Fedosyuk, V.M., and Makutina, L.N., Fiz. Tverd. Tela, 1992, vol. 34, p. 2801.
6. Popereka, M.Ya., Vnutrennie napryazheniya elektroliticheski osazhdennykh metallov (Internal Stresses in Electrolytically Deposited Metals), Novosibirsk: Zap.-Sib. Knizh. Izd., 1966.
7. Hirsch, P., Howie, A., Nicholson, R.B., et al., Electron Microscopy of Thin Crystals, London, 1965.
8. Translated under the title Elektronnaya mikroskopiya tonkikh kristallov, Moscow: Mir, 1968.
9. Hirsh, J. and Lots, P., Teoriya dislokatsii (The Theory of Dislocations), Moscow: Atomizdat, 1972.
10. Boltushkin, A.V., Tochitskii, T.A., and Fedosyuk, V.M., Elektrokhimiya, 1989, vol. 25, p. 359.
11. Gorelik, S.S. and Rastorguev, L.A., Rentgenograficheskii i elektronograficheskii analiz (X-ray and Electron Diffraction Analyses), Moscow: Metallurgiya, 1970.