The electrochemical behavior of iridium dioxide modified by ion implantation

Russian Journal of Electrochemistry

Volumn 32, Issue 6, 1996, Pages 691-695

  Kulikova, L N ^a   Fateev, V N ^a   De Battisti, A ^b   Rusanov, V D ^c  

^a KURCHATOV INSTITUTE   (Russian Federation)

^b UNIVERSITY OF FERRARA   (Italy)

^c Institute of Hydrogen Power Engineering and Plasma Technologies   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21344458460     PISSN: 10231935     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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