Effects of oxygen content on the penetration depth of pulsed laser deposited YBCO thin films

Chinese Journal of Physics

Volumn 34, Issue 2 II, 1996, Pages 606-610

  Hsieh, M C ^a,b   Tseng, T Y ^a,b   Wei, S M ^a,b   Fu, C M ^a,b   Wu, K H ^a,b   Juang, J Y ^a,b   Uen, T M ^a,b   Gou, Y S ^a,b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL KAOHSIUNG NORMAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21344457180     PISSN: 05779073     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)

1. E. Osquiguil et al. Appl. Phys. Lett. 60, 1627 (1992).
2. Keikichi Nakamura el al. Physica C213, 1 (1993).
3. J. D. Jorgensen et al. Phys. Rev. B41, 1863 (1990).