Laser ablated Ni-doped Hf O2 thin films: Room temperature ferromagnets

Applied Physics Letters

Volumn 86, Issue 24, 2005, Pages 1-3

  Hong, Nguyen Hoa ^a   Sakai, Joe ^b   Poirot, Nathalie ^a,c   Ruyter, Antoine ^a  

^a UMR 6157 CNRS CEA   (France)

^b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^c IUT de Blois   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTRIC INSULATORS; FERROMAGNETIC MATERIALS; FERROMAGNETISM; HAFNIUM COMPOUNDS; LASER ABLATION; MAGNETIC ANISOTROPY; MAGNETIC DOMAINS; MAGNETIC MOMENTS; NICKEL; PERMITTIVITY; X RAY DIFFRACTION ANALYSIS;

FERROMAGNETIC INSULATORS (FI); GROWTH CONDITIONS; MAGNETIC FORCE MICROSCOPY; ROOM TEMPERATURE;

THIN FILMS;

EID: 21344435556     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1949723     Document Type: Article

References (6)

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