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Volumn 22, Issue 3, 2005, Pages 240-246
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New test paradigms for yield and manufacturability
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
CRYSTAL DEFECTS;
FAILURE ANALYSIS;
NANOTECHNOLOGY;
OPTIMIZATION;
STATISTICAL TESTS;
PARAMETRIC YIELD;
RANDOM YIELD;
SYSTEMATIC YIELD;
INTEGRATED CIRCUIT MANUFACTURE;
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EID: 21244492003
PISSN: 07407475
EISSN: None
Source Type: Journal
DOI: 10.1109/MDT.2005.67 Document Type: Article |
Times cited : (3)
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References (0)
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