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Volumn 13, Issue 7, 2005, Pages 2731-2741
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Deterministic control of thin film thickness in physical vapor deposition systems using a multi-aperture mask
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Author keywords
[No Author keywords available]
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Indexed keywords
DIELECTRIC FILMS;
ION BEAMS;
LITHIUM COMPOUNDS;
MAGNETIC STORAGE;
MICROELECTRONICS;
NIOBIUM COMPOUNDS;
POLISHING;
SPUTTERING;
SUBSTRATES;
THIN FILMS;
MULTI APERTURE MASKS;
OPTICAL FABRICATION;
THIN FILMS - COATINGS;
THIN FILMS - DEPOSITION AND FABRICATION;
PHYSICAL VAPOR DEPOSITION;
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EID: 21244489004
PISSN: 10944087
EISSN: 10944087
Source Type: Journal
DOI: 10.1364/OPEX.13.002731 Document Type: Article |
Times cited : (26)
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References (7)
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