Effects of dry etching processes on optical properties of ZnTe surface layers in ultraviolet region

Applied Surface Science

Volumn 249, Issue 1-4, 2005, Pages 216-221

  Wu, S ^a   Ren, Z Q ^a   Shen, W Z ^a   Ogawa, H ^b   Guo, Q X ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b SAGA UNIVERSITY   (Japan)

Author keywords

Dry etching processes; Optical properties; Ultraviolet; Zinc telluride (ZnTe)

Indexed keywords

CRYSTAL STRUCTURE; ELECTROMAGNETIC WAVE REFLECTION; ELECTRON BEAMS; OPTICAL PROPERTIES; PHONONS; SURFACE PHENOMENA; ULTRAVIOLET RADIATION; ZINC COMPOUNDS;

DRY ETCHING PROCESS; PHOTON ENERGY; ULTRAVIOLET; ZINC TELLURIDE (ZNTE);

REACTIVE ION ETCHING;

EID: 21244473637     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.11.088     Document Type: Article

References (22)

1. D. Lee, J. Zucker, M.D. Divino, R.F. Austin, R.D. Feldman, K.L. Jones, and A.M. Johnson Appl. Phys. Lett. 59 1991 1867
2. F. Hiei, M. Ikeida, M. Ozawa, T. Miyajima, A. Ishibashi, and K. Akimoto Electron. Lett. 21 1993 878
3. S. Valette, G. Labrunie, J.C. Deutsch, and J. Lizet Appl. Opt. 16 1977 1289
4. M. Schall, M. Walther, and P. Uhd Jepsen Phys. Rev. B 64 2001 094301
5. G. Gallot, J.Q. Zhang, R.W. McGowan, T.I. Jeon, and D. Grischkowsky Appl. Phys. Lett. 74 1999 3450
6. G. Gallot, and D. Grischkowsky J. Opt. Soc. Am. B 16 1999 1204
7. Q.X. Guo, M. Matsuse, T. Tanaka, M. Nishio, H. Ogawa, Y. Chang, J. Wang, and S.L. Wang J. Vac. Sci. Technol., A 19 2001 2232
8. W.R. Chen, S.J. Chang, Y.K. Su, W.H. Lan, A.C.H. Lin, and H. Chang Jpn. J. Appl. Phys., Part 1 39 2000 3308
9. A. Matsutani, F. Koyama, and K. Iga Jpn. J. Appl. Phys. 30 1991 2123
10. S. Wu, W.Z. Shen, H. Ogawa, and Q.X. Guo Chin. Phys. 12 2003 1026
11. S. Wu, Z.Q. Ren, W.Z. Shen, H. Ogawa, and Q.X. Guo J. Appl. Phys. 94 2003 3800
12. R. Liu, C.M. Gu, L.R. He, S. Wu, W.Z. Shen, H. Ogawa, and Q.X. Guo Acta Phys. Sin. 53 2004 1217
13. J.P. Walter, and M.L. Cohen Phys. Rev. B 1 1970 2661
14. J.L. Freeouf Phys. Rev. B 7 1973 3810
15. Y. Furumura, A. Ebina, and T. Takahashi Phys. Rev. B 19 1979 1031
16. K. Sato, and S. Adachi J. Appl. Phys. 73 1993 926
17. Q.X. Guo, Y. Matsumoto, S.L. Wang, T. Tanaka, M. Nishio, and H. Ogawa Jpn. J. Appl. Phys., Part 1 41 2002 5069
18. B. Langen, H. Leiderer, W. Limmer, W. Gebhardt, M. Ruff, and U. Rossler J. Cryst. Growth 101 1990 718
19. G.F. Feng, R. Zallen, J.M. Epp, and J.G. Dillard Phys. Rev. B 43 1991 9678
20. M. Rahman J. Appl. Phys. 82 1997 2215
21. J.H. Sun, W.B. Xie, W.Z. Shen, H. Ogawa, and Q.X. Guo J. Appl. Phys. 94 2003 7144
22. G.F. Feng, and R. Zallen Phys. Rev. B 40 1989 1064