Plasmonic lithography

Proceedings of the 3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications

Volumn , Issue , 2004, Pages 99-100

  Srituravanich, W ^a   Fang, N ^a   Sun, C ^a   Durant, S ^a   Ambati, M ^a   Zhang, X ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; FINITE DIFFERENCE METHOD; ION BEAMS; LIGHT POLARIZATION; MASKS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; PHOTORESISTS; TIME DOMAIN ANALYSIS; ULTRAVIOLET RADIATION;

FOCUSED ION BEAMS (FIB); HIGH DENSITY OPTICAL LITHOGRAPHY; PLASMONIC LITHOGRAPHY; PLASMONIC OPTICS;

SURFACE PLASMON RESONANCE;

EID: 21244445028     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/nano2004-46023     Document Type: Conference Paper

References (4)

1. Ebbesen, T.W.; Lezec, H. J.; Ghaemi, H. F.; et al, "Extraordinary optical transmission through subwavelength hole arrays", Nature, 391(1998)667.
2. Thio T., Pellerin K.M., Linke R.A., Lezec HJ., Ebbesen T.W., "Enhanced light transmission through a single subwavelength aperture." Opt. Lett., 26(2001)1972.
3. Salomon L, Grillot F, Zayats AV, de Fornel F., "Near-field distribution of optical transmission of periodic subwavelength holes in a metal film," Phys. Rev. Lett, 86(2001)1110.
4. Werayut Srituravanich, Nicholas Fang, Cheng Sun, Qi Luo, and Xiang Zhang. Plasmonic Nanolithography, Nano. Lett., 4(2004)1085.