Evaluation of the diffusion coefficient of nitrogen in Fe 4 N 1-x nitride layers during microwave post-discharge nitriding

Applied Surface Science

Volumn 249, Issue 1-4, 2005, Pages 54-59

  Campos, I ^a   Torres, R ^a   Bautista, O ^a   Ramirez G ^b   Zuniga L ^a  

^a SCHOOL OF ENGINEERING AND SCIENCES   (Mexico)

^b INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

Diffusion coefficient; Growth kinetics; Nitride layer; Nitriding; Post discharge

Indexed keywords

DIFFUSION; GROWTH KINETICS; MATHEMATICAL MODELS; MICROWAVES; NITRIDING; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT; THERMODYNAMICS;

NITRIDE LAYERS; NITROGEN DIFFUSION; POST-DISCHARGE; THERMOCHEMICAL PROCESS;

NITROGEN;

EID: 21244435972     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.11.029     Document Type: Article

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