Pulsed laser deposition of Er3+-doped oxyfluoride thin films

Journal of Non-Crystalline Solids

Volumn 351, Issue 21-23, 2005, Pages 1810-1813

  Martino, M ^a,e   Caricato, A P ^a   Fazzi, A ^a   Romano, F ^a   Tikhomirov, V K ^b   Seddon, A B ^b   Mattarelli, M ^c   Chiappini, A ^c   Vishnubhatla, K C ^c,d  

^a UNIVERSITY OF SALENTO   (Italy)

^b UNIVERSITY OF NOTTINGHAM   (United Kingdom)

^c UNIVERSITY OF TRENTO   (Italy)

^d UNIVERSITY OF HYDERABAD   (India)

^e Dipartimento di Fisica   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ERBIUM; EXCIMER LASERS; GLASS CERAMICS; LIGHT TRANSMISSION; OPTOELECTRONIC DEVICES; POSITIVE IONS; PULSED LASER DEPOSITION; STOICHIOMETRY;

EMISSION BANDS; ERBIUM DOPED FIBER AMPLIFIERS (EDFA); MATRIX-ION SYSTEMS; OPTICAL SIGNALS;

THIN FILMS;

EID: 21144452023     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.04.021     Document Type: Conference Paper

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