Synthetic diamond electrodes: The effect of surface microroughnesson the electrochemical properties of CVD diamond thin films on titanium

Journal of Applied Electrochemistry

Volumn 35, Issue 9, 2005, Pages 857-864

  Pleskov, Yu V ^a   Evstefeeva, Yu E ^a   Krotova, M D ^a   Lim, P Y ^b,c   Shih, H C ^c   Varnin, V P ^d   Teremetskaya, I G ^d   Vlasov, I I ^e   Ralchenko, V G ^e  

^a FRUMKIN INSTITUTE OF PHYSICAL CHEMISTRY AND ELECTROCHEMISTRY   (Russian Federation)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^d RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^e PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

Author keywords

Diamond; Electrochemical kinetics; Microroughness; Thin film electrode; Titanium substrate

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; DIAMONDS; ELECTROCHEMISTRY; ETCHING; REACTION KINETICS; SURFACE ROUGHNESS; THIN FILMS; TITANIUM;

ELECTROCHEMICAL KINETICS; MICROROUGHNESS; THIN FILM ELECTRODES; TITANIUM SUBSTRATES;

ELECTRODES;

EID: 21144442070     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10800-005-2572-0     Document Type: Article

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