From MEMS to nanomachine

Journal of Physics D: Applied Physics

Volumn 38, Issue 13, 2005, Pages

  Esashi, Masayoshi ^a   Ono, Takahito ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BLOOD; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; ELECTROSTATICS; GYROSCOPES; MICROSTRUCTURE; REACTIVE ION ETCHING; SILICON;

BLOOD PRESSURE; ELECTRON FIELD EMITTERS; MONOLITHIC SYSTEMS; NANOMACHINES;

MICROELECTROMECHANICAL DEVICES;

EID: 21044457228     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/13/R01     Document Type: Article

References (35)

1. Finne R M and Klein D L 1967 A water-amine-complexing agent system for etching silicon J. Electrochem. Soc. 114 965-70
2. Wallis G and Pomerantz D I 1969 Field assisted glass-metal sealing J. Appl. Phys. 49 3946-9
3. Tufte O N, Phapman P W and Long D 1962 Silicon diffused-element pioezoresistive diaphragms J. Appl. Phys. 33 3322-7
4. Terry S C, Jerman J H and Angell J B 1979 A gas chromatographic air analyzer fabricated on a silicon wafer IEEE Trans. Electron Devices 1880-6
5. Peterson K 1982 Silicon as a mechanical material Proc. IEEE 70 420-57
6. Fan L S, Tai Y C and Muller R S 1988 IC-processed electrostatic micro-motors 1988 IEEE Int. Electron Devices Meeting (San Fransisco) pp 666-9
7. Goodenough F 1991 Airbags boom when IC accelerometer sees 50 G Electron. Des. 39 45-56
8. Hornbeck L J 1995 Digital light processing and MEMS convergence for a bright future Micromachining and Microfabrication'95 SPIE pp 3-20
9. Lutz M, Golderer W, Gerstenmeier J, Marek J, Maihofer B and Schubert D 2004 A precision yaw rate sensor in silicon micromachining SAE Int. Cong. Expo. (Detroit) pp 37-41
10. Nagao M, Watanabe H, Nakatani E, Shirai K, Aoyama K and Hashimoto M 2004 A silicon micromachined gyroscope and accelerometer for vehicle stability control system 2004 SAE World Congress (Detroit) 2004-01-1113
11. Ruby R C, Bradley P, Larson J D III and Oshmyansky Y 1999 PCS 1900 MHz duplexer using thin film bulk acoustic resonators (FBARS) Electron. Lett. 35 794
12. Nomura K 2004 Piezoelectric thin film MEMS angular rate sensor 8th SEMI Microsystem/MEMS Seminar (Makuhari) pp 23-34
13. Brand O and Fedder G K 2005 CMOS-MEMS (Weinheim: Wiley-VCH)
14. Takinami M, Minami K and Esashi M 1992 High-speed directional low-temperature dry etching for bulk silicon micromachining Technical Digest of the 11th Sensor Symp. (Tokyo) pp 15-18
15. Choi J, Minami K and Esashi M 1996 Application of deep reactive ion etching for silicon angular rate sensor Microsyst. Technol. 2 186-99
16. Larmer F and Schilp P 1994 Method of anisotropically etching silicon German Patent 4241045
17. Murakoshi T et al 2003 Electrostatically levitated ring-shaped rotational gyro/accelerometer Japan J. Appl. Phys. 42 2468-72
18. Katsumata T, Haga Y, Minami K and Esashi M 2000 Micromachined 125 νm diameter ultra miniature fiber-optic pressure sensor for catheter Trans. IEE of Japan 120-E 58-63
19. Shimokawa F 1992 High-power fast-atom beam source and its application to dry etching J. Vac. Sci. Technol. A 10 1352-7
20. Ahn Y, Ono T and Esashi M 2004 Microfabricated AFM Si probe with lateral actuators for independent parallel applications ICEE 2004/APCOT MNT 2004 (Sapporo) pp 912-15
21. Iwami K, Ono T and Esashi M 2004 Optical near-field imaging using micromachined gap variable bow-tie antenna probe in visible region 8th Int. Conf. on Near-field Nano Optics and Related Techniques (NFO-8) (Seoul) p 216
22. Li X, Abe T, Liu Y and Esashi M 2002 Fabrication of high-density electrical feed-throughs by deep-reactive-ion etching of Pyrex glass J. Microelectromech. Syst. 11 625-9
23. Li X, Abe T, Hara M and Esashi M 2003 Large-diameter wafer process of array-MEMS with electrical interconnection through a thin glass wafer Proc. 20th Sensor Symp. (Tokyo) pp 425-8
24. Lee D W, Ono T, Abe E and Esashi M 2002 Microprobe array with electrical interconnection for thermal imaging and data storage J. Microelectromech. Syst. 11 215-19
25. Bae J H, Ono T and Esashi M 2003 Boron-doped diamond scanning probe for thermo-mechanical nanolithography Diamond Relat. Matr. 12 2128-35
26. Takahashi H, Ono T, Cho Y and Esashi M 2004 Diamond probe for ultra-high-density ferroelectric data storage based on scanning nonlinear dielectric microscopy Proc. MEMS2004 (Maastricht) pp 536-9
27. Ono T, Yoshida S and Esashi M 2003 Electrical modification of a conductive polymer using a scanning probe microscope Nanotechnology 14 1051-4
28. Yoshida S, Ono T, Ohi S and Esashi M 2004 Reversible conductivity modulation of conductive polymer using scanning probe microscope Tohoku Convention of Applied Physics (Sendai) (in Japanese)
29. Zhang D Y, Ono T and Esashi M 2003 Piezoactuator integrated monolithic microstage with six degrees of freedom Transducers'03 (Boston) pp 1518-21
30. Xu H, Ono T, Esashi M, Okamoto K and Zhang D-Y 2004 Monolithic PZT microstage Proc. 21st Sensor Symp. (Kyoto) pp 13-18
31. Chang C, Abe T and Esashi M 2004 Trench filling characteristics of low stress TEOS/ozone oxide deposited by PECVD and SACVD Microsyst. Technol. 10 97-102
32. Min K-O, Tanaka S and Esashi M 2004 Glass press mold fabricated by SiC APCVD, SiC-SiC bonding and silicon lost molding Proc. 21st Sensor Symp. (Kyoto) pp 473-8
33. Totsu K, Higashitani A and Esashi M 2004 Gray scale lithography using mask-less exposure system Sensor Symp. Late news (Kyoto) p 78
34. Ono T, Miyashita H and Esashi M 2002 Electric-field-enhanced growth of carbon nanotubes for scanning probe microscopy Nanotechnology 13 62-4
35. Minh P N, Hong P N, Cuong T M, Ono T and Esashi M 2004 Utilization of carbon nanotube and diamond for electron field emission devices Proc. MEMS2004 (Maastricht) pp 430-3