Precision poly-(dimethyl siloxane) masking technology for high-resolution powder blasting

Journal of Microelectromechanical Systems

Volumn 14, Issue 3, 2005, Pages 619-624

  Pawlowski, Anne Gabrielle ^a   Sayah, Abdeljalil ^a   Gijs, Martin A M ^a  

^a EPFL   (Switzerland)

Author keywords

Glass; High resolution; Masking technology; Poly (dimethyl siloxane) (PDMS); Powder blasting

Indexed keywords

ALUMINA; BRITTLENESS; EPOXY RESINS; ETCHING; GLASS; PARTICLE SIZE ANALYSIS; PHOTOSENSITIVITY;

HIGH RESOLUTION POWDER BLASTING; MASKING TECHNOLOGY; POLY DIMETHYL SILOXANE;

SILICONES;

EID: 21044441743     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2005.844745     Document Type: Article

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