In situ Process Control of Electrolytic Metal Deposition

Zeitschrift fur Physikalische Chemie

Volumn 208, Issue Part_1_2, 1999, Pages 211-223

  Plieth, W ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; COPPER METALLOGRAPHY; DEPOSITION; FOURIER TRANSFORMS; GOLD METALLOGRAPHY; LIGHT SCATTERING; METADATA; PLATING; RAMAN SPECTROSCOPY; SILVER METALLOGRAPHY;

ANALYTICAL DETERMINATION; AUTOCORRELATION FUNCTIONS; DISTRIBUTION DIAGRAM; FOURIER TRANSFORMATIONS; GALVANIC DEPOSITION; SERS; SURFACE CONCENTRATION; SURFACED-ENHANCED RAMAN;

PROCESS CONTROL;

EID: 21044441264     PISSN: 09429352     EISSN: None     Source Type: Journal    
DOI: 10.1524/zpch.1999.208.Part_1_2.211     Document Type: Article

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