Magnetization reversal in patterned double-vortex structures

Journal of Applied Physics

Volumn 97, Issue 10, 2005, Pages

  Buchanan, K S ^a   Guslienko, K Yu ^a   Choe, S B ^b   Doran, A ^b   Scholl, A ^b   Bader, S D ^a   Novosad, V ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC FIELD ANNEALING; MAGNETIC SOFTENING; MAGNETOCRYSTALLINE ANISOTROPY; TRANSVERSE FIELDS;

ANNEALING; COERCIVE FORCE; MAGNETIC ANISOTROPY; MAGNETIC FIELD EFFECTS; NANOSTRUCTURED MATERIALS; ROTATION;

SOFT MAGNETIC MATERIALS;

EID: 20944444636     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1855207     Document Type: Conference Paper

References (8)

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2. V. Novosad, Phys. Rev. B 65, 060402 R (2002).
3. ZEP-520A is a high sensitivity e-beam resist of positive tone produced by Nippon Zeon Co. (http:www.zeon.co.jp). ZEP consists of a copolymer of - chloromethacrylate and- methalstyrene.
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5. A. Thompson, X-Ray Data Booklet, LBNLPUB-490 Rev. 2 (2001).
6. M. R. Scheinfein, LLG Micromagnetics Simulator™.
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8. K. Buchanan (unpublished).