Effect of rapid thermal annealing on the structure and magnetic properties of chemical vapor deposition cobalt layers

Journal of Applied Physics

Volumn 97, Issue 10, 2005, Pages

  Deo, N ^a   Bain, M F ^a   Montgomery, J H ^a   Gamble, H S ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

HYSTERESIS LOOPS; LAYER RESISTIVITY; SHEET RESISTANCE;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COBALT COMPOUNDS; MAGNETIC HYSTERESIS; MAGNETIZATION; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; X RAY DIFFRACTION;

RAPID THERMAL ANNEALING;

EID: 20944442043     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1862012     Document Type: Conference Paper

References (3)

1. K. G. Ashar, Magnetic Disk Drive Technology: Heads, Media, Channel, Interfaces, and Integration (IEEE, New York, 1997).
2. N. Deo, 2003 in Symposium VI, " CVD XVI and EURO-CVD 14., " 203rd Meeting of The Electrochemical Society, Paris, France, 27 April-2 May 2003, p. 1008.
3. N. Deo, " Chemical Vapor Deposition of Thin Film Metal Layers for Magnetic Applications., " Ph.D. thesis, The Queen's University of Belfast, UK, 2004.