Optimization of high B sat FeCo films for write pole applications

Journal of Applied Physics

Volumn 97, Issue 10, 2005, Pages

  Mao, Ming ^a   Schneider, Thomas ^a   Bubber, Randhir ^a   Kools, Jacques ^a   Liu, Xubo ^b   Altounian, Zaven ^b   Lee, Chih Ling ^a   Devasahayam, Adrian ^a   Rook, Katrina ^a  

^a VEECO INSTRUMENTS INC   (United States)

^b MCGILL UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PARAMETERS; LAMINATION; SATURATION FLUX DENSITY; VEECO CLUSTER DEPOSITION;

BINARY ALLOYS; COERCIVE FORCE; DEPOSITION; MAGNETOSTRICTION; MAGNETRON SPUTTERING; OPTIMIZATION; SOFT MAGNETIC MATERIALS;

MAGNETIC FILMS;

EID: 20944439911     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1853951     Document Type: Conference Paper

References (4)

1. R. M. Bozorth, Ferromagnetism (IEEE Press, New York, 1993), p. 195.
2. N. X. Sun and S. X. Wang, IEEE Trans. Magn. 36, 2506 (2000).
3. H. Katada, T. Shimatsu, I. Watanabe, H. Muraoka, and Y. Nakamura, IEEE Trans. Magn. 38, 2225 (2002).
4. H. S. Jung, W. D. Doyle, J. E. Wittig, J. F. Al-Sharab, and J. Bentley, Appl. Phys. Lett. 81, 2415 (2002).