Crystallographic analysis of CoPtCr-Si O2 perpendicular recording media with high anisotropy using synchrotron radiation x-ray diffraction

Journal of Applied Physics

Volumn 97, Issue 10, 2005, Pages

  Kubo, T ^a   Kuboki, Y ^a   Ohsawa, M ^a   Tanuma, R ^a   Saito, A ^a   Oikawa, T ^a   Uwazumi, H ^a   Shimatsu, T ^b  

^a FUJI ELECTRIC CO   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

IN-PLANE DIFFRACTION; MAGNETIC LAYERS; PHASE FORMATION; X RAY ENERGY;

COBALT COMPOUNDS; CRYSTALLOGRAPHY; ELECTROMAGNETIC WAVE DIFFRACTION; EPITAXIAL GROWTH; MAGNETIC ANISOTROPY; SILICA; STACKING FAULTS; SYNCHROTRON RADIATION; X RAY DIFFRACTION ANALYSIS;

MAGNETIC FILMS;

EID: 20944435889     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1855572     Document Type: Conference Paper

References (5)

1. T. Oikawa, M. Nakamura, H. Uwazumi, T. Shimatsu, H. Muraoka, and Y. Nakamura, IEEE Trans. Magn. 38, 1976 (2002).
2. H. Uwazumi, K. Enomoto, Y. Sakai, S. Takenoiri, T. Oikawa, and S. Watanabe, IEEE Trans. Magn. 39, 1914 (2003).
3. M. Zheng, B. R. Acharya, G. Choe, J. N. Zhou, Z. D. Yang, E. N. Abarra, and K. E. Johnson, IEEE Trans. Magn. 40, 2498 (2004).
4. T. Shimatsu, IEEE Trans. Magn. 40, 2483 (2004).
5. T. Shimatsu, IEEE Trans. Magn. (to be published).