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Volumn 279, Issue 3-4, 2005, Pages 311-315

Growth of InN on Ge substrate by molecular beam epitaxy

Author keywords

A3. Molecular beam epitaxy; B2. Semiconducting germanium; B3. Heterojunction semiconductor devices; B3. Semiconducting III V materials

Indexed keywords

DOPING (ADDITIVES); GALLIUM; HETEROJUNCTIONS; INTERFACES (MATERIALS); MOLECULAR BEAM EPITAXY; PHOTOLUMINESCENCE; SEMICONDUCTING GERMANIUM; SEMICONDUCTOR DEVICES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 20844452183     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.02.041     Document Type: Article
Times cited : (17)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.