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Volumn 279, Issue 3-4, 2005, Pages 311-315
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Growth of InN on Ge substrate by molecular beam epitaxy
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Author keywords
A3. Molecular beam epitaxy; B2. Semiconducting germanium; B3. Heterojunction semiconductor devices; B3. Semiconducting III V materials
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Indexed keywords
DOPING (ADDITIVES);
GALLIUM;
HETEROJUNCTIONS;
INTERFACES (MATERIALS);
MOLECULAR BEAM EPITAXY;
PHOTOLUMINESCENCE;
SEMICONDUCTING GERMANIUM;
SEMICONDUCTOR DEVICES;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
BANDGAP;
EPILAYERS;
HETEROJUNCTION SEMICONDUCTOR DEVICES;
SEMICONDUCTING III-V MATERIALS;
SEMICONDUCTING INDIUM COMPOUNDS;
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EID: 20844452183
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.02.041 Document Type: Article |
Times cited : (17)
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References (14)
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