Well-ordered large-area arrays of epitaxial ferroelectric (Bi,La) 4 Ti3 O12 nanostructures fabricated by gold nanotube-membrane lithography

Applied Physics Letters

Volumn 86, Issue 15, 2005, Pages 1-3

  Lee, Sung Kyun ^a   Lee, Woo ^a   Alexe, Marin ^a   Nielsch, Kornelius ^a   Hesse, Dietrich ^a   Gösele, Ulrich ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; GOLD; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOTUBES; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

GOLD NANOTUBE-MEMBRANE LITHOGRAPHY; LARGE-AREA ARRAYS; MECHANICAL SYSTEMS; SCANNING FORCE MICROSCOPY;

FERROELECTRIC MATERIALS;

EID: 20844444733     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1899239     Document Type: Article

References (14)

1. B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee, and W. Jo, Nature (London) 401, 682 (1999).
2. H. N. Lee and D. Hesse, Appl. Phys. Lett. 80, 1040 (2002).
3. H. Maiwa, N. Iizawa, D. Togawa, T. Hayashi, W. Sakamoto, M. Yamada, and S. Hirano, Appl. Phys. Lett. 82, 1760 (2003).
4. Y. L. Du, M. S. Zhang, Q. Chen, Z. R. Yuan, Z. Yin, and Q. A. Zhang, Solid State Commun. 124, 113 (2002).
5. M. Hiratani, C. Okazaki, H. Hasegawa, N. Sugii, Y. Tarutani, and K. Takagi, Jpn. J. Appl. Phys., Part 1 36, 5219 (1997).
6. C. S. Ganpule, A. Stanishevsky, S. Aggarwal, J. Melngailis, E. Williams, R. Ramesh, V. Joshi, and C. A. P. de Araujo, Appl. Phys. Lett. 75, 3874 (1999).
7. C. Harnagea, M. Alexe, J. Schilling, J. Choi, R. B. Wehrspohn, D. Hesse, and U. Gösele, Appl. Phys. Lett. 83, 1827 (2003).
8. A. Roelofs, T. Schneller, K. Szot, and R. Waser, Appl. Phys. Lett. 81, 5231 (2002).
9. W. Ma, C. Harnagea, D. Hesse, and U. Gösele, Appl. Phys. Lett. 83, 3770 (2003).
10. W. Lee, 2004 MRS Fall Meeting, Symposium on Innovations for Sub- 100 nm Lithography-Materials and Processes, Boston, MA. C5.5 [Chem. Mater. (submitted)].
11. J. Choi, K. Nielsch, M. Reiche, R. B. Wehrspohn, and U. Gösele, J. Vac. Sci. Technol. B 21, 763 (2003).
12. T. Sakai, T. Watanabe, H. Funakubo, K. Saito, and M. Osada, Jpn. J. Appl. Phys., Part 1 42, 166 (2003).
13. C. Harnagea, A. Pignolet, M. Alexe, D. Hesse, and U. Gösele, Appl. Phys. A: Mater. Sci. Process. 70, 261 (2000).
14. S. E. Cummins and L. E. Cross, J. Appl. Phys. 39, 2268 (1968).