General model and segregation coefficient measurement for ultrashallow doping by excimer laser annealing

Applied Physics Letters

Volumn 86, Issue 22, 2005, Pages 1-3

  Gillet, Jean Numa ^a   Degorce, Jean Yves ^a   Meunier, Michel ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DOPING (ADDITIVES); MATHEMATICAL MODELS; MOS CAPACITORS; PARTIAL DIFFERENTIAL EQUATIONS; RAPID THERMAL ANNEALING; SOLIDIFICATION; THIN FILMS; VECTORS;

EXCIMER LASER ANNEALING; SPATIAL VARIATION; ULTRASHALLOW DOPING;

EXCIMER LASERS;

EID: 20844443781     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1927275     Document Type: Article

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