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Volumn 281, Issue 1, 2005, Pages 17-31

Growth of thick GaN layers with hydride vapour phase epitaxy

Author keywords

A1. Characterization; A1. Computer simulation; A1. Defects; A3. Chloride vapour phase deposition; B1. Gallium nitride

Indexed keywords

CHARACTERIZATION; COMPUTER SIMULATION; CRYSTAL GROWTH; DISLOCATIONS (CRYSTALS); INTERFACES (MATERIALS); SEMICONDUCTOR LASERS; VAPOR PHASE EPITAXY;

EID: 20744457920     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.03.040     Document Type: Conference Paper
Times cited : (59)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.