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Volumn 281, Issue 1, 2005, Pages 17-31
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Growth of thick GaN layers with hydride vapour phase epitaxy
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Author keywords
A1. Characterization; A1. Computer simulation; A1. Defects; A3. Chloride vapour phase deposition; B1. Gallium nitride
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Indexed keywords
CHARACTERIZATION;
COMPUTER SIMULATION;
CRYSTAL GROWTH;
DISLOCATIONS (CRYSTALS);
INTERFACES (MATERIALS);
SEMICONDUCTOR LASERS;
VAPOR PHASE EPITAXY;
CHLORIDE VAPOR PHASE DEPOSITION;
DISLOCATION DENSITY;
GROWTH CHEMISTRY;
HYDRIDE VAPOR PHASE EPITAXY (HVPE);
GALLIUM NITRIDE;
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EID: 20744457920
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.03.040 Document Type: Conference Paper |
Times cited : (59)
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References (20)
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