Annealing effects on the microstructure and properties of Y(Ni,Mn)O3 thin films

Journal of the European Ceramic Society

Volumn 25, Issue 12 SPEC. ISS., 2005, Pages 2147-2150

  Ma, Yanwei ^a,b   Guilloux Viry, M ^b   Barahona, P ^b,d   Pena O ^b   Moure, C ^c  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (China)

^b UNIVERSITÉ DE RENNES 1   (France)

^c INSTITUTO DE CERÁMICA Y VIDRIO   (Spain)

^d UNIVERSITY OF CHILE   (Chile)

Author keywords

Films; Magnetic properties; Perovskites

Indexed keywords

ANNEALING; FERROMAGNETISM; HIGH TEMPERATURE EFFECTS; LASER ABLATION; MAGNETIC PROPERTIES; MICROSTRUCTURE; PHASE TRANSITIONS; PULSED LASER DEPOSITION; YTTRIUM COMPOUNDS;

FERROMAGNETIC TRANSITION TEMPERATURE; HIGH TEMPERATURE OXYGEN ANNEALING; LASER ABLATED DEPOSITION; THERMAL ANNEALING;

THIN FILMS;

FILM;

EID: 20444447132     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2005.03.061     Document Type: Article

References (5)

1. 3 epitaxial thin films prepared by pulsed laser deposition Phys. Stat. Sol. (a) 201 2004 2385-2389
2. 3 J. Phys. Chem. Solids 61 2000 2019-2024
3. 3 thin films: A phase diagram in the ferromagnetic region Appl. Phys. Lett. 75 1999 1446-1448
4. 3 electrode Appl. Phys. Lett. 81 2002 2067
5. 3 thin films Appl. Phys. Lett. 74 1999 1033-1035