Laser-induced blistering of thin SiO2 on Si

Microscale Thermophysical Engineering

Volumn 9, Issue 2, 2005, Pages 155-164

  Serrano, Justin R ^a,b   Cahill, David G ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b MS 1310 ^*  (United States)

Author keywords

Blistering; Delamination; Laser induced damage; Silicon dioxide; Thin films

Indexed keywords

BLISTERING; INTERFACE FLAWS; THERMAL FATIGUE; THERMAL OXIDATION;

ATOMIC FORCE MICROSCOPY; BUCKLING; COMPRESSIVE STRESS; DELAMINATION; FATIGUE OF MATERIALS; INTERFACES (MATERIALS); LASER BEAM EFFECTS; LASER PULSES; OXIDATION; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SILICA; THIN FILMS; VOLUME MEASUREMENT;

LASER DAMAGE;

EID: 20444403791     PISSN: 10893954     EISSN: 10917640     Source Type: Journal    
DOI: 10.1080/10893950590945030     Document Type: Article

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