The low-temperature thermal oxidation of copper, Cu3O 2, and its influence on past and future studies

Vacuum

Volumn 79, Issue 1-2, 2005, Pages 71-83

  Cocke, D L ^a   Schennach, R ^b   Hossain, M A ^a   Mencer, D E ^c   McWhinney, H ^d   Parga, J R ^e   Kesmez, M ^a   Gomes, J A G ^a   Mollah, M Y A ^f  

^a Lamar University   (United States)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^c WILKES UNIVERSITY   (United States)

^d PRAIRIE VIEW A AND M UNIVERSITY   (United States)

^e INSTITUTO TECNOLÓGICO DE SALTILLO   (Mexico)

^f UNIVERSITY OF DHAKA   (Bangladesh)

Author keywords

Copper; Cu2O; Cu3O2; CuxO; CuO; Galvanostatic Reduction; Linear Sweep Voltammetry; Modified Cabrera and Mott (C M) Model; Pulse Field Desorption Mass Spectrometry (PFDMS); XPS

Indexed keywords

COPPER OXIDES; ELECTROCHEMISTRY; MASS SPECTROMETRY; RAMAN SPECTROSCOPY; REDUCTION; SURFACE PROPERTIES; THERMOOXIDATION; VOLTMETERS; X RAY PHOTOELECTRON SPECTROSCOPY;

CU2O; CU3O2; CUO; CUXO; GALVANOSTATIC REDUCTION; LINEAR SWEEP VOLTAMMETRY; MODIFIED CABRERA AND MOTT (C-M) MODEL; PULSE FIELD DESORPTION MASS SPECTROMETRY (PFDMS);

COPPER;

EID: 20444368786     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.01.010     Document Type: Article

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