Step and flash nanoimprint lithography in Europe

2004 4th IEEE Conference on Nanotechnology

Volumn , Issue , 2004, Pages 655-656

  Schulz, Hubert ^a   Pavlicek, Herbert ^a   Reng, Norbert ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

FI; Ano imprint lithography; Multilayer processing; Net generation lithography

Indexed keywords

AMPLIFIERS (ELECTRONIC); ELECTRIC FIELD EFFECTS; FUSED SILICA; HIGH PRESSURE EFFECTS; MULTILAYERS; NANOSTRUCTURED MATERIALS; POLYMERS; SHRINKAGE; SILICON WAFERS; VISCOSITY;

-FI; ANO IMPRINT TECHNOLOGY; MULTI-LAYER PROCESSING; NET GENERATION LITHOGRAPHY;

LITHOGRAPHY;

EID: 20344400652     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. http: public.itrs.net
2. M. Colburn, S. ohnson, M. Stewart, S. Damle, T. Bailey, B. . Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, . Ekerdt, and C. G. Willson, te an lash m rint itho ra h A e A roach to i h esolution atternin, Proceedings of SPIE , pp. 379-389, 1999
3. http: www.smt.zeiss.com nts
4. S.V. Sreenivasan, . Choi, P. Shoemaker, . McMackin, D. Babbs, "Step and Repeat UV Nanoimprint Lithography roc. Beam Con erence une