-
2
-
-
19944431400
-
Application of low temperature direct bonding in optical devices and integrated systems
-
K. Hiller, Application of low temperature direct bonding in optical devices and integrated systems, Proceedings of MICRO SYTEM Technologies (2003) 102-109.
-
(2003)
Proceedings of MICRO SYTEM Technologies
, pp. 102-109
-
-
Hiller, K.1
-
3
-
-
4244182319
-
Hermetic glass sealing by electrostatic bonding
-
P. R. Younger, Hermetic glass sealing by electrostatic Bonding, J. Non-Crystalline Solids, vol. 38 and 39, (1980) 909.
-
(1980)
J. Non-crystalline Solids
, vol.38-39
, pp. 909
-
-
Younger, P.R.1
-
4
-
-
0032205788
-
Formation of silicon-gold eutectic bond using localized heating method
-
Liwei Lin et al., Formation of silicon-gold eutectic bond using localized heating method, Japanese Journal of Applied Physics Part II, Vol. 11B, (1998) 1412-1414.
-
(1998)
Japanese Journal of Applied Physics Part II
, vol.11 B
, pp. 1412-1414
-
-
Lin, L.1
-
5
-
-
3042737312
-
Bonding and contacting of MEMS-structures on wafer level
-
Paris, April 27 - May 2
-
M. Wiemer et al. Bonding and contacting of MEMS-structures on wafer level. The Electrochemical Society 203 rd meeting, Paris, April 27 - May 2, (2003).
-
(2003)
The Electrochemical Society 203 rd Meeting
-
-
Wiemer, M.1
-
6
-
-
0035277919
-
Low-temperature full wafer adhesive bonding
-
F. Niklaus et al., Low-temperature full wafer adhesive bonding, J. Micromech. Microeng. 11 (2001) 1-8.
-
(2001)
J. Micromech. Microeng.
, vol.11
, pp. 1-8
-
-
Niklaus, F.1
-
7
-
-
0041431012
-
Selective wafer-level adhesive bonding with bezocyclobutene for fabrication of cavities
-
J. Oberhammer et al., Selective wafer-level adhesive bonding with bezocyclobutene for fabrication of cavities, Sensors and Actuators A: Physical, vol. 105, 3 (2003) 297-304.
-
(2003)
Sensors and Actuators A: Physical
, vol.105
, Issue.3
, pp. 297-304
-
-
Oberhammer, J.1
-
8
-
-
0036735653
-
A low-temperature wafer bonding technique using patternable materials
-
C-T Pan et al., A low-temperature wafer bonding technique using patternable materials, J. Micromech. Microeng. 12 (2002) 611-615.
-
(2002)
J. Micromech. Microeng.
, vol.12
, pp. 611-615
-
-
Pan, C.-T.1
-
10
-
-
0037231215
-
Influence of processing conditions on the thermal and mechanical properties of SU-8 negative photoresist coatings
-
R. Feng and R. J. Farris, Influence of processing conditions on the thermal and mechanical properties of SU-8 negative photoresist coatings, J. Micromech. Microeng. 13 (2003) 80-88.
-
(2003)
J. Micromech. Microeng.
, vol.13
, pp. 80-88
-
-
Feng, R.1
Farris, R.J.2
-
11
-
-
0036544009
-
A novel high aspect ratio technology for MEMS fabrication using standard silicon wafers
-
A. Bertz, A novel high aspect ratio technology for MEMS fabrication using standard silicon wafers, Sensors and Actuators A 97-98 (2002) 691-701.
-
(2002)
Sensors and Actuators A
, vol.97-98
, pp. 691-701
-
-
Bertz, A.1
-
12
-
-
33644949327
-
Bonding of silicon wafers for silicon-on-insulator
-
W. P. Maszara et al., Bonding of silicon wafers for silicon-on-insulator, J. Appl. Phys. 64(10) (1988) 4943-4950.
-
(1988)
J. Appl. Phys.
, vol.64
, Issue.10
, pp. 4943-4950
-
-
Maszara, W.P.1
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