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Volumn 1, Issue , 2001, Pages 1641-1644
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Fabrication of 200 to 2700 GHz multiplier devices using GaAs and metal membranes
a a a b a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC LOADS;
ELECTRON BEAM LITHOGRAPHY;
NETWORKS (CIRCUITS);
REACTIVE ION ETCHING;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTOR DIODES;
METAL MEMBRANES;
MONOLITHIC CIRCUITS;
MULTIPLIER DEVICES;
WET CHEMICAL;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 20244364771
PISSN: 0149645X
EISSN: None
Source Type: Journal
DOI: 10.1109/MWSYM.2001.967219 Document Type: Article |
Times cited : (92)
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References (6)
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