Ultra-fast and sensitive photo-induced phase switching in (EDO-TTF) 2PF6

Journal of Luminescence

Volumn 112, Issue 1, 2005, Pages 275-278

  Chollet, Matthieu ^a   Guerin, Laurent ^a,b   Uchida, Naoki ^a   Fukaya, Souichi ^a   Ishikawa, Tadahiko ^a   Koshihara, Shin Ya ^a,c   Matsuda, Kazunari ^e,f   Yamochi, Hideki ^f   Ota, Akira ^d   Saito, Gunzi ^d  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITÉ DE RENNES 1   (France)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^d KYOTO UNIVERSITY   (Japan)

^e KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^f KYOTO UNIVERSITY   (Japan)

Author keywords

Femtosecond pulse laser; Insulator to metal; Photo induced phase transition

Indexed keywords

COMPUTER SIMULATION; IRRADIATION; METAL INSULATOR TRANSITION; PHASE TRANSITIONS; PHOTONS; REFLECTION; SINGLE CRYSTALS; SWITCHING SYSTEMS; ULTRASHORT PULSES;

FEMTOSECOND PULSE LASERS; INSULATOR TO METAL; PHASE SWITCHING DEVICES; PHOTO-INDUCED PHASE TRANSITIONS;

ELECTRIC CONDUCTORS;

EID: 20144386482     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2004.09.048     Document Type: Conference Paper

References (2)

1. A. Ota, H. Yamochi, and G. Saito J. Mater. Chem. 12 2002 2600
2. O. Drozdova, K. Yakushi, A. Ota, H. Yamochi, and G. Saito Synth. Met. 133-134 2003 277