Single atom Si nanoelectronics using controlled single-ion implantation

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 279-286

  Mitic, M ^a   Andresen, S E ^a   Yang, C ^b   Hopf, T ^b   Chan, V ^a   Gauja, E ^a   Hudson, F E ^a   Buehler, T M ^a   Brenner, R ^a   Ferguson, A J ^a   Pakes, C I ^b   Hearne, S M ^b   Tamanyan, G ^b   Reilly, D J ^a   Hamilton, A R ^a   Jamieson, D N ^b   Dzurak, A S ^a   Clark, R G ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b UNIVERSITY OF MELBOURNE   (Australia)

Author keywords

Electron beam lithography; Integrated particle detectors; Nanoelectronics; Nanolithography; Quantum computing; Single electron transistors; Single atom devices; Single ion implantation

Indexed keywords

CHARGE TRANSFER; ELECTRON BEAM LITHOGRAPHY; ION BEAMS; ION IMPLANTATION; NANOTECHNOLOGY; SILICON; SILICON WAFERS;

INTEGRATED PARTICLE DETECTORS; NANOELECTRONICS; QUANTUM COMPUTING; SINGLE ELECTRON TRANSISTORS; SINGLE-ATOM DEVICES; SINGLE-ION IMPLANTATION;

NANOSTRUCTURED MATERIALS;

EID: 20144376096     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.096     Document Type: Conference Paper

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