Stability of tunnel structure and relationship between peel load and spatiotemporal pattern by deformed adhesive during peeling

Journal of the Physical Society of Japan

Volumn 73, Issue 8, 2004, Pages 2342-2346

  Yamazaki, Yoshihiro ^a   Toda, Akihiko ^b  

^a WASEDA UNIVERSITY   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Adhesion; Pattern formation; Peeling process; Phase diagram; State variable; Tunnel formation; Viscoelastic behavior

Indexed keywords

ADHESIVE AGENT;

ARTICLE; DYNAMICS; ELASTICITY; MECHANICS; PHASE SEPARATION; STRUCTURE ANALYSIS; SURFACE PROPERTY; VISCOELASTICITY;

EID: 20044393713     PISSN: 00319015     EISSN: None     Source Type: Journal    
DOI: 10.1143/JPSJ.73.2342     Document Type: Article

References (6)

1. D. Satas: Handbook of Pressure Sensitive Adhesive Technology (Van Nostrand Reinhold, New York, 1989) 2nd ed.
2. G. R. Strobl: The Physics of Polymers (Springer-Verlag, Berlin, 1997).
3. Y. Urahama: J. Adhes. 31 (1989) 47.
4. Y. Yamazaki and A. Toda: J. Phys. Soc. Jpn. 71 (2002) 1618.
5. T. Saito: private communication.
6. B. N. J. Persson: Sliding Friction (Springer-Verlag, Berlin, 1998).