ArF immersion lithography using TWINSCAN technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5645, Issue , 2005, Pages 196-207

  Mulkens, Jan ^a   Streefkerk, Bob ^a   Hoogendorp, Martin ^a  

^a ASML   (Netherlands)

Author keywords

193 nm; High NA; Immersion lithography; TWINSCAN

Indexed keywords

ARGON; DATA ACQUISITION; IMAGE ANALYSIS; IMAGING TECHNIQUES; OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER; REFRACTIVE INDEX; SEMICONDUCTOR DEVICES;

193-NM; HIGH NA; IMMERSION LITHOGRAPHY; TWINSCAN™;

PHOTOLITHOGRAPHY;

EID: 20044381898     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.578071     Document Type: Conference Paper

References (2)

1. B. Sluijk et.al., Performance results of a new generation of 300 mm lithography systems, SPIE Vol. 4346, 1999
2. J. Mulkens et.al, Optical Lithography Solutions for the 65-nm and 45-nm Node, Semicon Japan 2003