Dependence of EUV emission properties on laser wavelength

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5448, Issue PART 2, 2004, Pages 1159-1164

  Yamaura, Michiteru ^a   Uchida, Shigeaki ^a   Sunahara, Atsushi ^a   Shimada, Yoshinori ^a   Hashimoto, Kazuhisa ^a   Yamanaka, Chiyoe ^a   Shigemori, Keisuke ^b   Fujioka, Shinsuke ^b   Okuno, Tomoharu ^b   Nagai, Keiji ^b   Norimatsu, Takayoshi ^b   Nishimura, Hiroaki ^b   Nishihara, Katsunobu ^b   Miyanaga, Noriaki ^b   Izawa, Yasukazu ^b  

^a INSTITUTE FOR LASER TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

EUV source; Laser plasma; Tin plasma

Indexed keywords

COMPUTER SIMULATION; LASER PRODUCED PLASMAS; LITHOGRAPHY; OPTIMIZATION; PHOTODIODES; PROJECT MANAGEMENT; SPECTROMETERS;

CONVERSION EFFICIENCY; EUV SOURCES; LASER PLASMA; TIN-PLASMA;

ULTRAVIOLET RADIATION;

EID: 19944427787     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557207     Document Type: Conference Paper

References (17)

1. M.Richardson et al. "The case for Tin as an EUV source" 2 nd International EUVL Symposium.
2. U. Stamm et al. "High power gas discharge and laser produced plasma sources for EUV Lithography" 2nd International EUVL Symposium.
3. I.V.Fomenkov et.al "Performance of a dense plasma focus light source for EUV lithography" 2nd International EUVL Symposium.
4. J.Pankert et. al "Power Scaling, Electrode Lifetime and Debris Mitigation of the Philips EUV Source" 2nd International EUVL Symposium.
5. K.Nishihara et al. "Japan MEXT leading Project for Laser-Produced Plasma EUV light source development" 2nd International EUVL Symposium.
6. M.Yamaura et al. "Dependence of EUV Emission Properties on Drive Laser Wavelength" 2nd International EUVL Symposium.
7. M.Nakai et al. "Experimental Study on Basic Properties of Laser-Produced Plasma as an EUV Source on GEKKO XII " 2nd International EUVL Symposium.
8. H.Nishimura et al. "Characterization of EUV Emission from Laser Produced Low-Density Tin-oxidized plasmas" 2nd International EUVL Symposium.
9. T.Tomie et al. "Progress of tin plasma technologies at AIST " 2nd International EUVL Symposium.
10. T.Mochizuki et al. "Studies on x-ray conversion efficiency in Xe cryogenic targets" 2nd International EUVL Symposium.
11. A.Endo et al. "Laser-Produced-Plasma Light Source Development for EUV Lithography at EUVA" 2nd International EUVL Symposium.
12. K.Hotta The Review of Laser Engineering.29 (2001) 638 (in Japanese)
13. B.Hansson "Status of the Liquid-Xenon-Jet Laser-Plasma EUV Source" 1st International EUVL Symposium.
14. Y.Shimada et al. submitted to Appl.Phys Lett.
15. R.C. Spitzer et al. J.Appl.Phys. 79, 2251(1996)
16. A. Sunahara et al. "Hydrodynamic Simulation of Laser produced Plasma EUVL",2nd International EUVL symposium.
17. G.O'Sullivan et al. J.Opt.Soc.Am.71 227 (1981)