Summary of recent research on gas cluster ion beam process technology

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 232, Issue 1-4, 2005, Pages 195-199

  Yamada, Isao ^a   Toyoda, Noriaki ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Gas cluster ion beam processing; Infusion doping; Lateral sputtering; Smoothing; Thin film formation; Ultra shallow implantation

Indexed keywords

INDUSTRIAL APPLICATIONS; ION BEAMS; ION BOMBARDMENT; NANOTECHNOLOGY; SEMICONDUCTOR DEVICES; SPUTTERING; THERMAL EFFECTS; THIN FILMS;

GAS CLUSTER ION BEAM PROCESSING; INFUSION DOPING; LATERAL SPUTTERING; SMOOTHING; THIN FILM FORMATION; ULTRA SHALLOW IMPLANTATION;

GASES;

EID: 19944392901     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.03.044     Document Type: Conference Paper

References (12)

1. I. Yamada in: Proceedings of 14th Symposium on Ion Sources and Ion-Assisted Technology, Tokyo 1991 The Ion Engineering Society of Japan Tokyo 227
2. I. Yamada Radiat. Eff. Deff. Solids 124 1992 69
3. E.E. Becker F. Trager G. Zu Putlitz Proceedings of International Symposium on Metal Clusters - 1986 1986 Springer-Verlag Berlin 1
4. I. Yamada, J. Matsuo, N. Toyoda, and A. Kirkpatrick Mater. Sci. Eng. R34 2001 231
5. K. Owaki, S. Nakagawa, N. Toyoda, and I. Yamada 4th workshop on cluster ion beam and advanced quantum beam process technology 2003 Osaka Science and Technology Center Osaka 129
6. N. Toyoda, I. Yamada, 2003 MRS Fall Meeting, Symposium R: Radiation Effects and Ion Beam Processing of Materials, Mat. Res. Soc. Symp. Proc. 792, 2004, p. 623.
7. S. Kakuta, S. Sasaki, K. Furusawa, T. Seki, T. Aoki, and J. Matsuo 4th workshop on cluster ion beam and advanced quantum beam process technology 2003 Osaka Science and Technology Center Osaka 35
8. N. Miyatake, K. Murata, T. Ichihasi, and M. Ebata 4th workshop on cluster ion beam and advanced quantum beam process technology 2003 Osaka Science and Technology Center Osaka 156
9. T. Ogaswa, K. Kawabe, M. Inoue, T. Seki, and J. Matsuo 4th workshop on cluster ion beam and advanced quantum beam process technology 2003 Osaka Science and Technology Center Osaka 149
10. E. Bourelle, A. Suzuki, A. Sato, T. Seki, and J. Matsuo 4th workshop on cluster ion beam and advanced quantum beam process technology 2003 Osaka Science and Technology Center Osaka 41
11. J. Hautala 4th workshop on cluster ion beam and advanced quantum beam process technology 2003 Osaka Science and Technology Center Osaka 117
12. B. White, J. Wolf, G. Book, C. Doughty, and J. Hautala 4th workshop on cluster ion beam and advanced quantum beam process technology 2003 Osaka Science and Technology Center Osaka 29