SCOPUS 정보 검색 플랫폼

Volumn 248, Issue 1-4, 2005, Pages 190-195

Laser patterning of SiO x -layers for the fabrication of UV diffractive phase elements

Author keywords

Diffractive phase elements; Laser ablation; SiO 2; SiO x; UV laser

Indexed keywords

ANNEALING; DIFFRACTION; LASER ABLATION; MULTILAYERS; OXIDATION; SUBSTRATES; THICKNESS MEASUREMENT; ULTRAVIOLET RADIATION;

DIFFRACTIVE PHASE ELEMENTS; PHASE FUNCTIONS; SIOX; UV LASERS;

SILICA;

EID: 19944387280 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2005.03.096 Document Type: Conference Paper

Times cited : (34)

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