Water-resisting compound red-sensitive photopolymer: Mechanism and optimization of components

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5636, Issue PART 2, 2005, Pages 635-645

  Xiaojing, Hu ^a   Heling, Zhang ^a   Guangyong, Zhang ^a   Yan, Sheng ^a   Yunzhi, Wang ^a   Ruiqu, Zhao ^a  

^a CAPITAL NORMAL UNIVERSITY   (China)

Author keywords

Compound sensitization; Hologram; Red sensitive photopolymer(RSP); Sensitivity; Water resistibility

Indexed keywords

HOLOGRAMS; LIGHT ABSORPTION; OPTIMIZATION; PHOTOPOLYMERIZATION; PHOTOSENSITIVITY; ULTRAVIOLET RADIATION;

ACTINIC RADIATION; COMPOUND SENSITIZATION; RED-SENSITIVE PHOTOPOLYMERS (RSP); WATER-RESISTIBILITY;

OPTICAL MATERIALS;

EID: 19844381987     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.574577     Document Type: Conference Paper

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