Plasma sprayed ceramics for low macroscopic field emitters

High Temperature Material Processes

Volumn 9, Issue 1, 2005, Pages 103-108

  Tomaszek, R ^a,b   Znamirowski, Z ^b   Pawlowski, L ^a   Grimblot, J ^a   Zdanowski, J ^b   Czarczynski, W ^b  

^a Ecole Nationale Superieure de Chimie de Lille   (France)

^b WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Field electron emitters; Laser engraving; Plasma spraying

Indexed keywords

ALUMINUM COMPOUNDS; CURRENT VOLTAGE CHARACTERISTICS; DIODES; ELECTRON EMISSION; FIELD EMISSION CATHODES; PLASMA SPRAYING; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; TITANIUM DIOXIDE;

FIELD ELECTRON EMITTERS; FIELD EMISSION; FIELD ENHANCEMENT; LASER ENGRAVED LAYERS;

CERAMIC COATINGS;

EID: 19844380473     PISSN: 10933611     EISSN: None     Source Type: Journal    
DOI: 10.1615/HighTempMatProc.v9.i1.90     Document Type: Article

References (3)

1. C. A. Spindt, A thin-film field emission cathode, J. Appl. Phys. 39 (1968) 3504.
2. R. G. Forbes, Low-macroscopic-field electron emission from carbon films and other electrically nanostructured heterogenous materials: hypothesis about emission mechanism, Solid-State Electronics 45 (2001)779-808.
3. 2, Surface and Coatings Technology 187 (2004) 37-46.