Software to simulate dry etch in photomask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 183-189

  Babin, S ^a   Bay, K ^a   Okulovsky, S ^a  

^a ABEAM TECHNOLOGIES   (United States)

Author keywords

Dry etch; Etch profile; Maskmaking; Simulation

Indexed keywords

ANISOTROPY; BOUNDARY CONDITIONS; COMPUTER SIMULATION; COMPUTER SOFTWARE; LOADING; MASKS; MATHEMATICAL MODELS; OPTIMIZATION; PLASMA THEORY; SIMULATION; SOFTWARE ENGINEERING;

CRITICAL DIMENSIONS (CD); DRY ETCH; ETCH PROFILE; MASKMAKING;

DRY ETCHING;

EID: 19844375020     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.575426     Document Type: Conference Paper

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